ASML Netherlands B.V. |
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De Run 6501
Veldhoven
5504 DR
Netherlands
[t] +31 40 268 3000
[f] +31 40 268 2000
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ASML is the world's leading provider of lithography systems for the semiconductor industry, manufacturing complex machines that are critical to the production of integrated circuits or chips. Headquartered in Veldhoven, the Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. |
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ASML introduced its newest 193nm Step & Scan lithography tool for high-volume production of semiconductor devices at the 100nm technology node. The PAS 5500/1100TM system provides the highest value of ownership for leading-edge IC makers by combining a 0.75 numerical aperture lens, improved leveling performance and industry-leading overlay with an exposure capacity exceeding 90 200mm wafers per hour at a dose of 20 mJ/cm2. |
13 August 2007 |
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ASML Holding NV announced a new lithography system with the highest numerical aperture, 1.2, in the semiconductor industry. The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of volume chip production at the 45 nm node. |
12 August 2007 |
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ASML Holding NV announced the industry’s first immersion lithography system, the TWINSCAN XT:1250i, a 0.85 NA, 193 nm pre-production lithography scanner that combines the improved depth of focus of immersion tools with the precision of “dry” lithography systems. ASML has already booked a customer order for the XT:1250i with initial delivery set. |
11 August 2007 |
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ASML introduced the industry's first KrF (248nm) Step & Scan 300mm dual stage lithography system capable of 110nm resolution. The TWINSCAN AT:850B(tm) features Carl Zeiss Starlith(tm)850 advanced projection optics with a numerical aperture of 0.80, which is the highest NA available in a KrF system. |
10 August 2007 |
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ASML announces the introduction of dual wafer stage technology for new i-line and deep UV imaging systems, extending the product offerings of its TWINSCANTM 300mm technology platform. This dual wafer stage system optimizes the lithographic processing of 300mm wafers by parallel operation of two independent wafer stages. |
15 July 2007 |
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In a move to eliminate the growing gap between semiconductor design and sub-wavelength manufacturing, ASML MaskTools, a wholly owned subsidiary of ASML, and Mentor Graphics Corporation have signed a collaborative agreement. |
14 July 2007 |
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ASML Holding NV announced that semiconductor R&D consortium SEMATECH has awarded ASML a contract to qualify the imaging performance of advanced logic patterns, metrology structures and defect designs for the 45-nanometer (nm), 32-nm, and 22-nm technology nodes. |
13 July 2007 |
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ASML Holding NV and partners in the semiconductor lithography supply chain provided an update today on their progress towards the commercialization of extreme ultraviolet lithography. |
12 July 2007 |
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ASML Holding NV announced that Hynix Semiconductor Inc., one of the world’s leading memory manufacturers, has standardized on ASML's LithoCruiser software for the company's process development activity. Hynix has purchased multiple licenses of LithoCruiser to perform lithography simulation and optimization for critical layers in all sub-60-nanometer DRAM and flash memory devices. |
11 July 2007 |
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ASML Holding NV introduced its newest TWINSCAN system, an advanced 193-nanometer (nm) exposure system which features imaging, overlay and throughput improvements. |
10 July 2007 |
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ASML Holding NV and Brion Technologies, Inc. announced that they have signed an agreement for ASML to acquire privately held Brion, a leading provider of semiconductor design and wafer manufacturing optimization solutions for advanced lithography. |
09 July 2007 |
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ASML Holding NV announced today that it shipped two extreme ultraviolet Alpha Demo Tools to customers. Both the College of Nanoscale Science and Engineering of the State University of New York at Albany, N.Y., and the nanoelectronics research institute IMEC in Leuven, Belgium, have received these industry first, full field EUV systems. |
29 August 2006 |
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ASML Holding NV today announced that it is preparing to ship its 500th TWINSCAN lithography system. This milestone demonstrates the acceptance of the TWINSCAN platform as the semiconductor industry’s standard for 300-millimeter (mm) lithography, which has helped ASML sustain the leading market share position for the past several years. |
11 July 2006 |
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ASML Holding NV today introduced the semiconductor industry’s most advanced lithography system, the ASML TWINSCAN XT:1900i. In combination with ASML proprietary low k1 capabilities, this new system extends optical lithography for volume production to 40-nanometer (nm) and below. |
11 July 2006 |
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ASML Holding NV has expanded its capability to manufacture lithography systems in Veldhoven by introducing a flexible labor model. The company has executed a three-year time bank for employees to reinforce ASML’s ability to adapt more quickly to semiconductor market cycles, including support for potential 24-hour, seven days-a-week production activities. |
24 February 2006 |
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ASML Holding NV today presented its latest advances in leading-edge production technology as well as its research and development progress at SPIE Microlithography 2006 in San Jose, California. Images down to 42-nanometer (nm) printed on the ASML TWINSCAN XT:1700i system were shown along with results that support the viability of this tool for volume production across several nodes. |
22 February 2006 |
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ASML Holding NV today presented its latest advances in leading-edge production technology as well as its research and development progress at SPIE Microlithography 2006 in San Jose, California. Images down to 42-nanometer (nm) printed on the ASML TWINSCAN XT:1700i system were shown along with results that support the viability of this tool for volume production across several nodes. |
22 February 2006 |
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ASML Holding NV announced today that it shipped two extreme ultraviolet Alpha Demo Tools to customers. Both the College of Nanoscale Science and Engineering of the State University of New York at Albany, N.Y., and the nanoelectronics research institute IMEC in Leuven, Belgium, have received these industry first, full field EUV systems. |
07 December 2005 |
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ASML Holding NV today announced a new lithography system with the highest numerical aperture in the semiconductor industry. The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of volume chip production at the 45 nm node. The new system has a NA that jumped from 0.93 to 1.2, skipping the perceived, pre-immersion barrier of 1.0. The first shipment to a customer, a leading semiconductor manufacturer ordering its second ASML immersion system, will take place in Q1 2006. |
12 July 2005 |
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ASML Holding NV today announced that it had won a contract from ProMOS Technologies (ProMOS or the Company), a leading memory manufacturer, to supply lithography equipment to its new 300 mm wafer fab in Taiwan. This contract increases the presence of ASML in the Taiwanese memory market which produces one-fifth of the world’s DRAM devices. No financial details are being disclosed. |
05 May 2005 |
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ASML's lithography systems transfer circuit patterns onto silicon wafers to make every kind of chip we use today, as well as those for tomorrow. Manufacturers of mobile telephones, consumer electronics, personal computers and communication and information technology equipment continue to push the industry to new limits. |
17 February 2005 |
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Applied Materials, Inc. and ASML today announced a unique collaboration intended to speed the development of 65nm and below process equipment technology for the semiconductor industry. |
01 December 2004 |
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ASML Holding NV today announced that its immersion lithography program spans the globe with ‘wet’ lithography systems on three continents and both coasts of the United States. This comes just one year after the company announced the availability of industry’s first immersion system and the industry’s first customer order for that system. |
01 December 2004 |
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IMEC and ASML have agreed on the installation of a full-field EUV pre-production tool, to be installed in IMEC’s 300mm research facility in late 2005. An IMEC Industrial Affiliation Program on EUV lithography will begin in early 2006 and will focus on the 32nm node and beyond. |
28 October 2004 |
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Only a few months after IMEC launched its 193nm immersion lithography program, a worldwide consortium of more than 30 prominent players including IC manufacturers, tool suppliers, resist and BARC suppliers, mask shops and software suppliers are now members of the IMEC Industrial Affiliation Program. IMEC’s sub-45nm CMOS core partners have already committed to the program. |
12 October 2004 |
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ASML MaskTools today announced its new MaskWeaver product, a powerful mask design and optimization software solution enabling the creation of advanced photomasks for the nanometer era. |
24 September 2004 |
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ASML Holding NV and Nikon Corporation today announced their mutual agreement to request stays of the legal and administrative proceedings in each jurisdiction in which they have been pursuing claims related to their intellectual property dispute, including proceedings in Asia and the United States. |
02 September 2004 |
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Albany NanoTech of the University at Albany-State University of New York announced today that its College for Nanoscale Science and Engineering has installed and begun qualifying for 300mm wafers using the world’s first 193nm pre-production immersion lithography system. |
26 August 2004 |
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Cadence Design Systems, Inc. and ASML MaskTools, an ASML business unit, today announced a multi-year, multi-million dollar software licensing and joint development agreement for advanced resolution enhancement technology software solutions. The two companies will work together to develop a tightly integrated design for manufacturability flow. |
07 June 2004 |
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ASML Holding NV today introduced the newest member of its TWINSCAN platform, the TWINSCAN XT:1400. The system is a 0.93 NA, 193 nm scanner that images at the 65 nm node in volume production environments. The XT:1400 can also be used for pre-production testing and development at the 45 nm node. The first shipments are slated for December 2004. |
20 April 2004 |
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ASML Holding NV today announced that it won an order for a suite of lithography tools from Chartered Semiconductor Manufacturing, one of the world's top three dedicated semiconductor foundries, headquartered in Singapore. This multi-system sale further expands ASML’s installed base in Asia and secures ASML’s place as the leading provider of 300 mm equipment with systems in 20 of the world’s 29 300 mm fabs. |
25 March 2004 |
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ASML MaskTools and Dai Nippon Printing today announced a strategic alliance on CPL Technology. A single-mask, single-exposure resolution enhancement technique, CPL Technology is designed to increase the productivity of lithography processes by as much as 40 percent as compared with competing technologies as well as enhancing cost effectiveness and resolution capability. |
23 February 2004 |
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IMEC, Europe’s largest independent microelectronics and nanotechnology research center, extends its long-term collaboration with ASML to immersion lithography and will launch an industrial affiliation program on 193nm liquid immersion lithography that will run in parallel with its 157nm lithography IIAP. |
20 January 2004 |
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ASML Holding NV today announced its participation in High Tech Connections, a first-of-its-kind initiative to promote technological exchanges and strategic alliances between American and Dutch high technology companies. ASML’s role is that of a founding member and anchor company in this unique forum that brings together governments, academia and corporations to drive innovation and identify business and investment opportunities. |
07 January 2004 |
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ASML MaskTools and Photronics, Inc., today announced a strategic alliance to develop a production-ready, mask making infrastructure for ASML MaskTools’ CPL Technology. CPL is a resolution enhancement technique that enables low k1 lithography at advanced technology nodes. |
17 December 2003 |
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ASML Holding NV today announced it received the industry’s first order for an immersion lithography system from long-term partner Taiwan Semiconductor Manufacturing Company. The new tool, ASML’s TWINSCAN XT:1250i, is a high productivity, immersion scanner for production applications. |
03 December 2003 |
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ASML Holding NV today announced the industry’s first immersion lithography system, the TWINSCAN XT:1250i, a 0.85 NA, 193 nm pre-production lithography scanner that combines the improved depth of focus of immersion tools with the precision of “dry” lithography systems. |
03 December 2003 |
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ASML Holding NV and Tokyo Electron Limited today announced an agreement to enhance litho-cluster productivity and process performance through joint development programs and to facilitate customer demonstrations in Japan, the Netherlands and the U.S. through multiple tool exchanges. A litho-cluster is the linking of coater/developers and lithography systems used in semiconductor manufacturing. |
25 November 2003 |
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ASML Holding NV and Dainippon Screen Manufacturing Co., Ltd. (Dainippon Screen) have entered into an agreement to develop seamless litho-clustering methods. Litho-cluster is the linking of track and lithography systems used in semiconductor manufacturing. |
19 November 2003 |
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ASML Holding NV in a meeting tomorrow with investors and financial analysts will highlight several of the company’s operational and technological developments. |
12 November 2003 |
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To the casual observer, it looks like a round piece of glass in a metal holder, a bit larger than a hockey puck. However, the new PerfectWave metrology standard from ASML Optics enables reliable measurement of dimensions approaching the atomic scale. |
27 October 2003 |
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ASML Holding NV today introduced the new generation of its TWINSCAN platform, TWINSCAN XT:1250, a 0.85 NA, 193 nm volume production lithography scanner that extends imaging to the 65 nm node on both 200 mm and 300 mm wafers. ASML has already booked several customer orders for the XT:1250 with initial deliveries scheduled for the second quarter of 2004. |
21 October 2003 |
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Micronic Laser Systems AB (Micronic) and ASML Holding NV today announced that the two companies have signed a memorandum of understanding to form a joint venture company that will focus on the optical maskless lithography market for semiconductor manufacturing. |
18 July 2003 |
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ASML MaskTools today announced that Nanya Technology Corporation of Taiwan has licensed its proprietary software and intellectual property for deployment in Nanya’s advanced semiconductor production facilities. The capabilities provided by ASML MaskTools will enable Nanya to improve imaging performance in its next-generation process technologies. |
11 June 2003 |
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ASML Holding N.V. announces that the underwriters of its EUR 330 million offering of Convertible Subordinated Notes due 2010, that priced earlier today, have today exercised in full their right to purchase up to EUR 50 million additional principal amount of notes to cover over-allotments in connection with the offering. |
08 May 2003 |
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ASML Holding NV today announced that it is delivering the industry's first full-field 157 nanometer step-and-scan tool to Europe's leading independent research and development chip consortium, Interuniversities MicroElectronic Center. Called the Micrascan VII, the new system is the first 157 nm full-field tool able to create working chips. IMEC will receive shipment in April 2003. |
02 April 2003 |
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ASML MaskTools today announced that it has been awarded a business contract by Carl Zeiss SMT AG to support the design of high numerical aperture 193 nm and 157 nm lenses. Lens quality and consistency are increasingly important factors as line widths shrink to below half the wavelength of the exposure tool. ASML MaskTools was engaged to develop a unique method and software implementation for the lenses, improving layout cycle times while maintaining design quality. |
04 February 2003 |
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ASML Holding NV today announced a new system that enables semiconductor manufacturers to achieve greater yield of more sophisticated chips. Called the TWINSCAN AT:1200B Step & Scan System, this new addition to ASML’s product line is slated for delivery in mid-2003 |
20 November 2002 |
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ASML today announced that Headway Technologies, a TDK Group Company that designs and manufactures recording heads for hard disk drives, selected an ASML step & scan imaging tool for use in the production of thin film heads. The ASML PAS 5500/800(tm) DUV Step & Scan imaging system will be installed in the Headway facility in Milpitas, California in July 2002. |
13 June 2002 |
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The X Initiative and ASML Netherlands B.V. today announced that ASML has successfully produced the first processed wafer results for the X Architecture, a breakthrough chip architecture based on pervasively diagonal chip wiring. The X Initiative, a semiconductor supply-chain consortium chartered with accelerating the availability and fabrication of the X Architecture, announced the addition of ASML to its roster as the first member from the lithography equipment sector. |
22 April 2002 |
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ASML today announced that the company's TWINSCAN(tm) and PAS 5500(tm) lithography systems have achieved SEMI E78, Level 1 compliance certification. ASML's compliance with SEMI standard E78-0998, Electrostatic Compatibility: |
11 April 2002 |
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ASML Special Applications today introduced a new family of 5X i-line reduction steppers targeted for micro-electro-mechanical-systems and other applications such as compound semiconductors and ASICs.Through a dedicated options package, the new SA 5200 steppers the SA 5200/45C and SA 5200/55C can be optimized specifically for MEMS imaging. |
09 April 2002 |
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ASML MaskTools, Inc. today announced that Macronix International Co., Ltd., a leading Taiwanese semiconductor manufacturer, has purchased its MaskRigger(tm) product for widespread usage. Macronix will use MaskRigger to perform production optical proximity correction treatment across multiple generations of specialized memory devices. |
04 April 2002 |
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ASML MaskTools, Inc. will present detailed information on an innovative, extremely high transmission, phase shift technology at this year's SPIE Microlithography Symposium. This technology, known as Chromeless Phase LithographyTM, is designed to be a primary enabler for lithography at 70nm and below. |
28 February 2002 |
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ASML, one of the leading providers of 193 nm technology for advanced chip making, and its lens partner Carl Zeiss SMT AG today confirmed the availability of 193 nm imaging systems in 2002 to satisfy increased market demand for leading edge 0.10 micron ArF imaging solutions. |
07 February 2002 |
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ASML today announced it was selected by Semiconductor Manufacturing International Corporation to supply lithography systems for SMIC's new foundry operation in PuDong, Shanghai, China. |
17 January 2002 |
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ASML MaskTools, Inc. ('MaskTools') (Euronext Amsterdam N.V. and Nasdaq: ASML) and Numerical Technologies, Inc. today announced that they have entered into a licensing agreement that will provide semiconductor manufacturers with easier access to subwavelength manufacturing solutions that incorporate MaskTools' patented scattering bar technology. |
15 January 2002 |
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ASML today announced the first shipment of its dual-stage ArF (193nm) lithography system for 300mm wafer processing. The system was shipped this month to a leading global semiconductor manufacturer. |
21 December 2001 |
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ASML today introduced the industry's first KrF (248nm) Step & Scan 300mm dual stage lithography system capable of 110nm resolution. The TWINSCAN AT:850B(tm) features Carl Zeiss Starlith(tm)850 advanced projection optics with a numerical aperture of 0.80, which is the highest NA available in a KrF system. |
05 December 2001 |
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ASML Holding N.V. of the Netherlands today announced that it will converge its 193nm wavelength product offering onto a single platform, the TWINSCAN(tm) AT:1100, the industry's first high-productivity, dual-stage ArF (193nm) lithography system for 300mm wafer processing with 100nm resolution. |
27 November 2001 |
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ASML's Lithography division today announced the sale of Step & Scan systems to DongBu Electronics Co., Ltd. DongBu is equipping Korea's first all-scanner foundry and will use ASML's i-line and DUV Step & Scan systems to manufacture standard logic, analog and embedded flash products. |
09 October 2001 |
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ASML today announced the shipment of the first production unit of its new dual wafer stage TWINSCAN(tm) 300mm lithography system to Taiwan Semiconductor Manufacturing Company Ltd., the world's largest dedicated semiconductor foundry. TSMC will install the TWINSCAN AT:750(tm) system at its 300mm Fab 12 in Hsinchu, Taiwan. TSMC is already using the TWINSCAN platform in production, having taken delivery of the first single stage version,TWINSCAN AT:700S(tm),last year. |
16 September 2001 |
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ASML today announced it has shipped the first of its new PAS 5500/800(tm) KrF Step & Scan lithography systems, which offer the industry's highest numerical aperture (NA) of 0.80, to leading-edge DRAM memory manufacturers. |
09 August 2001 |
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ASML Holding N.V. today announced the industry's first high-productivity, dual-stage ArF (193nm) lithography system for 300mm wafer processing with 100nm resolution. Developed for volume production applications, the new AT:1100(tm) is a 193nm wavelength system with the industry's highest numerical aperture ArF lens (NA=0.75). |
09 July 2001 |
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Micronic Laser Systems AB and ASML Holding NV announced today that they have reached agreement in principle to enter into a strategic alliance to enhance the companies positions as leading suppliers of advanced lithography equipment to the display and semiconductor industry. |
20 June 2001 |
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KLA-Tencor Corp. and ASML today introduced new analysis software options that enable chipmakers to automatically transfer overlay test data between KLA-Tencor 5000 series overlay metrology tools and ASML PAS 5500(tm) series stepper and Step & Scan lithography tools. |
13 March 2001 |
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To help photolithography engineers and IC designers predict the manufacturability of their products before going into production, ASML MaskTools today introduced LithoCruiser(tm), the semiconductor industry's fastest simulation tool set for designing and optimizing lithography processes. LithoCruiser is the first product to enable real-time viewing of the lithography process windows based on simulation of circuit features, which allows engineers to optimize the total imaging process. |
27 February 2001 |
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Extending mature, cost-effective KrF (248nm-wavelength) lithography for volume production applications at 120nm resolution and beyond, ASML today introduced its newest deep UV Step & Scan system, the PAS 5500/800(tm). The system achieves 120nm resolution by means of the industry-leading numerical aperture of 0.80. |
31 January 2001 |
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ASM Lithography Holding N.V. and Silicon Valley Group, Inc. today announced that in order to provide additional time to address certain U.S. government inquiries pertaining to the pending merger, the companies, voluntarily requested the withdrawal of their filing in connection with the Exon-Florio review process and plan to refile their petition by the end of the month. |
08 January 2001 |
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In a move to eliminate the growing gap between semiconductor design and sub-wavelength manufacturing, ASML MaskTools, a wholly owned subsidiary of ASML, and Mentor Graphics Corporation have signed a collaborative agreement. |
09 December 2000 |
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ASML today announces the introduction of dual wafer stage technology for new i-line and deep UV imaging systems, extending the product offerings of its TWINSCANTM 300mm technology platform. This dual wafer stage system optimizes the lithographic processing of 300mm wafers by parallel operation of two independent wafer stages. |
06 December 2000 |
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ASML today introduced its newest 193nm Step & Scan lithography tool for high-volume production of semiconductor devices at the 100nm technology node. The PAS 5500/1100TM system provides the highest value of ownership for leading-edge IC makers by combining a 0.75 numerical aperture (NA) lens, improved leveling performance and industry-leading overlay with an exposure capacity exceeding 90 200mm wafers per hour at a dose of 20 mJ/cm2. |
07 November 2000 |
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ASML's Special Applications division today introduced a new i-line lithography system for 0.35-micron imaging, designed to assist customers as they transition from manufacturing technologies above 0.5 micron to tighter resolutions. |
10 October 2000 |
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ASML MaskTools today announced that UMC, a leading semiconductor foundry, has licensed ASML MaskTools optical extension technology for manufacturing advanced semiconductors with 150nm design rules. |
01 August 2000 |
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Nine leading-edge semiconductor manufacturers have joined ASML's industry-wide 157nm lithography technology program, which the lithography equipment leader launched 11 months ago. Advanced Micro Devices, Infineon, Motorola, Philips, Taiwan Semiconductor Manufacturing Company, ST Microelectronics and three other top ten IC manufacturers have joined ASML and its strategic technology partners, including Carl Zeiss, in the program to extend imaging capabilities and deliver 157nm lithography systems for advanced IC manufacturing by 2003. |
13 July 2000 |
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ASML MaskTools, a wholly owned subsidiary of ASML, today announced that International Business Machines has licensed ASML MaskTools patented scattering-bar technology for fabrication of application-specific integrated circuits with 130nm (0.13 micron) design rules. |
10 July 2000 |
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A new 300mm lithography platform enabling the highest productivity at the limits of optical technology has been announced by ASML, a world leader in semiconductor photolithography systems. The new platform and the first system in this new product family, the AT:700S(tm) scanner, were introduced today at the annual SEMICON/West trade show. |
10 July 2000 |
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ASML has announced the semiconductor industry's first KrF (248nm wavelength) lithography system optimized for high-volume production of ICs with 130nm design rules. The new PAS 5500/750E deep ultraviolet Step & Scan tool, introduced here at the annual SEMICON Europa trade show, provides a complete process solution by delivering significant improvements in imaging, overlay and productivity. |
04 April 2000 |
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In its first business with a manufacturer of surface acoustic wave components, ASML's Special Applications division has installed a PAS 5500/250C i-line stepper at Sawtek Inc.'s manufacturing facility outside Orlando, Florida. Capable of achieving sub-half-micron resolution, the lithography tool will be used in producing SAW filters for telecommunication applications. |
07 March 2000 |
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Further closing the gap between semiconductor design and manufacturing, ASML MaskTools, a wholly owned subsidiary of ASM Lithography, and Mentor Graphics Corporation offer the first three deliverables of their collaborative agreement from December 1999. |
29 February 2000 |
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