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News

Emerson announces new range of Mobrey magnetic level gauges

Emerson Process Management : 22 January, 2007  (New Product)
Emerson Process Management has announced a new range of Mobrey magnetic level gauges for the process industries. Based on proven magnetic float technology, the robust Mobrey gauges provide reliable level measurement of all liquids, including aggressive or toxic, without the need for an external power source. As a result, plant engineers can continue to monitor hazardous materials despite planned or unplanned power cuts.
Emerson Process Management has announced a new range of Mobrey magnetic level gauges for the process industries. Based on proven magnetic float technology, the robust Mobrey gauges provide reliable level measurement of all liquids, including aggressive or toxic, without the need for an external power source. As a result, plant engineers can continue to monitor hazardous materials despite planned or unplanned power cuts.

Emerson's new level gauges, which also provide basic or interface-level, lower-cost redundancy, have been designed for a variety of industries including power generation, offshore, petrochemical and food and beverage. They can operate in temperatures from -160 to +400 C with pressure ratings from PN6 to PN420 (ANSI 150 to 2500). The chamber is completely sealed so that the only moving part of the instrument in contact with the liquid is the stainless steel or titanium float, minimizing maintenance requirements and increasing product life. The indicator display provides easy clear visibility without requiring external power.

There are standard and high duty versions available in stainless steel or PVC, PPH, PVDF and PTFE for highly corrosive processes. A range of plug and vent/drain and flange assemblies can be requested according to each user's application requirements and standard or ATEX flame-proof mounted alarms and transmitters can also be included.

These new level gauges add to the breadth of Mobrey level instrumentation that features reliability and best fit for applications, contributing to the greater than 2 percent operations improvement made possible by PlantWeb digital plant architecture from Emerson.
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