ASHLAND-ACT LAUNCHES EZSTRIP™ LINE OF ETCH RESIDUE REMOVERS

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ASHLAND-ACT LAUNCHES EZSTRIP™ LINE OF ETCH RESIDUE REMOVERS
15 July 2003 - Ashland Inc

Ashland-ACT is introducing a new line of etch residue removers at SEMICON West (Booth 1015). The products, which are being marketed under the EZStrip brand, are new formulations for common semiconductor industry applications. The first three formulations in the line are being featured at SEMICON West.

EZStrip 1 and EZStrip 2 etch residue removers are HA-containing chemistries formulated using an improved solvent platform which enables these products to quickly and effectively remove etch residue and positive photoresist with minimal impact on critical dimensions of vias and metal lines. EZStrip 1 & EZStrip 2 etch residue removers have shown improved performance in some applications versus existing HA products.

EZStrip etch residue remover is a fluoride-containing formulation developed specifically for etch residue removal. Ashland-ACT specifically engineered this chemistry to provide a wide process latitude and to be compatible with advanced materials including Cu, low-k and porous low-k materials.

“We are pleased to introduce the new EZStrip product line to the semiconductor industry. These three products and others soon to be released are providing innovative new solvent systems to meet current and future customer requirements,” said Eric Tribolet, Product Manager for New Product Development.

All products are currently available through Ashland Specialty Chemical Company. Ashland-ACT launches EZStrip™ Line of Etch Residue Removers.

About: Ashland Inc

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