NEW HEAD FOR 3DAP PROCESS DEVELOPMENT AND APPLICATIONS DEPARTMENT
02 February 2005 - Oxford NanoScience Polaron Nanotechnology Division

Peter joins Oxford nanoScience from Seagate Technology Inc, where he had been responsible for a variety of sensor development and process development projects including the extensive use of the 3DAP for both GMR and TMR magnetoresistive sensor applications.

With a degree in Physics, a PhD involving the use of surface science techniques and a work history including materials characterization, device design and processing and development of new metrology solutions to meet future roadmap requirements, Peter also has extensive experience of the 3DAP instrumentation. He has worked in the FIM (Field Ion Microscopy) group at the Department of Materials, Oxford University with Professor Alfred Cerezo. He has also worked in close collaboration with the team in Oxford and whilst at Seagate was a key contributor to the pioneering application of 3DAP methods for wafer-deposited thin film structures including multilayer GMR stacks for data storage applications.

Oxford nanoScience managing director, Richard Davies, said: 'We're delighted to have Peter join us at an important time in the evolution of the technique. WIth 5 systems sold already into Japan alone, the 3DAP has matured beyond an instrument that is only used in University research departments by experts in the field. Its commercialisation means that more and more organisations are beginning to benefit from its unique ability to count. locate and chemically identify individual atoms in a solid material. Peter's role will be invaluable in showing prospective customers just what the instrument is capable of'.

Peter's primary role will be to perform customer demonstrations, develop new processes for sample investigations and offer post sales training and instrument validation support.

http://www.oxfordnanoscience.com

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