ASML MASKTOOLS AND PHOTRONICS FORM STRATEGIC ALLIANCE FOR CPL MASK MAKING INFRASTRUCTURE
17 December 2003 - ASML Netherlands B.V.

Customers using CPL Technology have the potential to extend the lifecycle of their current 193 nm processes to 90 nm and 65 nm nodes and, thereby, maximize their investments.

“ASML welcomes Photronics as the newest partner in our fast maturing CPL Technology development program. They will provide value to the program through their expertise and experience in high volume mask manufacturing,” said Dinesh Bettadapur, president and CEO, ASML MaskTools. “Establishing an efficient mask making infrastructure is one of the keys to enabling the adoption of a new technology such as CPL.”

A single mask, single exposure resolution enhancement technique, CPL can be broadly applied to logic and memory devices and is primarily targeted toward critical gate and contact layers.

Adoption of CPL technology by semiconductor manufacturers and foundries requires the availability of three critical components: leading edge software, advanced imaging systems and high-end photomasks. ASML MaskTools will deliver the software component through its LithoCruiser (CPL imaging simulation) and MaskWeaver (full-chip CPL mask data conversion) products. ASML will deliver the imaging components through its KrF and ArF TWINSCAN platform including the recently announced XT:1250 scanner. Photronics will deliver the mask component through the delivery of high quality CPL masks.

“As we transition to smaller and smaller geometries, the lithography challenges continue to grow, creating the need for innovative mask technologies. CPL Technology fills this need well and represents a very viable solution for extending optical lithography well beyond 90 nm,” said Chris Progler, chief scientist, Photronics, Inc. “We are excited about partnering with ASML in the development of this critical technology, for the benefit of the industry.”

As part of the agreement, Photronics will work with ASML to help develop a seamless CPL manufacturing flow that is optimized for Photronics’ advanced mask making process. In turn, ASML will provide Photronics with an R&D license for its extensive portfolio of CPL Technology patents encompassing the mask making, wafer imaging and software implementation domains. In addition, each side will promote each other’s CPL- related products and services to their common customer base.

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  • For December 2003
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  • For Lithography