MICRONIC LASER SYSTEMS AND ASML ANNOUNCE INTENDED JOINT VENTURE FOR OPTICAL MASKLESS LITHOGRAPHY
18 July 2003 - ASML Netherlands B.V.

Micronic Laser Systems AB (Micronic) and ASML Holding NV today announced that the two companies have signed a memorandum of understanding to form a joint venture company that will focus on the optical maskless lithography market for semiconductor manufacturing.

The goal of the JVC will be to develop an optical maskless lithography system by combining the semiconductor lithography technology of ASML with the mask pattern generator technology of Micronic based on its Spatial Light Modulator.

Maskless lithography is one of the possible solutions to manage escalating mask cost, which is becoming a dominant factor in bringing new semiconductor designs to market for advanced technology nodes. Designs produced in small quantities, designs with many changes or designs that require a fast time-to-market will particularly benefit from this technology.

The main advantage of optical maskless lithography over other maskless efforts is its compatibility with conventional volume lithography processes, allowing for a smooth process integration in existing semiconductor manufacturing facilities and an easy transfer to mask-based volume production.

http://www.asml.com

More News:
  • For July 2003
  • From ASML Netherlands B.V.
  • For Lithography