ASML MASKTOOLS TO SHOWCASE NEW MASKWEAVER PRODUCT
24 September 2004 - ASML Netherlands B.V.

ASML MaskTools today announced its new MaskWeaver product, a powerful mask design and optimization software solution enabling the creation of advanced photomasks for the nanometer era.

MaskWeaver is a hierarchical model-based OPC product that provides a complete implementation of ASML's patented chromeless phase lithography and double dipole lithography technologies, two highly innovative resolution enhancement techniques for sub-100 nm lithography. In order to further the development and adoption of MaskWeaver and CPL technology, MaskTools has established partnerships with a select group of leading edge semiconductor companies for the 90nm and 65nm nodes.

"MaskWeaver has been architected from the ground up to directly address the special mask making and lithography requirements of next generation technology nodes," said Dinesh Bettadapur, president and CEO, ASML MaskTools. "By being a primary enabler for CPL and DDL technologies, MaskWeaver has the potential to deliver significant value to our customers."

MaskWeaver is being showcased at the 22nd Annual BACUS Symposium on Photomask Technology, September 30-October 4 at the Monterey Convention Center in Monterey, California. During the exhibition portion of the show, October 1-2, ASML MaskTools will demonstrate MaskWeaver and its companion product, LithoCruiser. They will also present a paper and two posters showing the progress on various features of CPL technology including results from MaskWeaver and LithoCruiser .

http://www.asml.com

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