ASML BECOMES FIRST LITHOGRAPHY TOOL SUPPLIER TO ACHIEVE COMPLIANCE WITH SEMI ELECTROSTATIC COMPATIBILITY STANDARD
11 April 2002 - ASML Netherlands B.V.

ASML today announced that the company's TWINSCAN(tm) and PAS 5500(tm) lithography systems have achieved SEMI E78, Level 1 compliance certification. ASML's compliance with SEMI standard E78-0998, Electrostatic Compatibility: Guide to Assess and Control Electrostatic Discharge and Electrostatic Attraction for Equipment, demonstrates the absence of electrostatic charging of reticles and wafers in its tools, which is necessary to avoid ESD-related yield losses. ASML received the certification from Ion Systems, Inc., after the TWINSCAN and PAS 5500 performed well in a test procedure.

"Achieving the SEMI E78 standard compliance is further demonstration of ASML's leadership within the semiconductor lithography business because we are the first lithography supplier to receive this certification," said Paul van Attekum, ASML senior vice president of product marketing. "The problem of reticle and wafer charging was recognized many years ago and ASML's designs have been made ESD-friendly ever since. Effective management of electrostatic issues is part of our continuing commitment to provide our customers systems with optimal tool characteristics. "

"Ion Systems has developed a full test procedure to perform SEMI E78 compliance testing. Achieving compliance with this standard confirms tool suitability for high-end semiconductor manufacturing, which is especially important as an increasing number of customers migrate to 300 mm fabs. The benefits of electrostatics management are extremely important and play an integral role in helping customers avoid ESD-related yield losses," said Yuen Lee, senior vice president, professional services, Ion Systems.

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