NUMERICAL TECHNOLOGIES TO LICENSE ASML MASKTOOLS PATENTED SCATTERING BAR TECHNOLOGY
15 January 2002 - ASML Netherlands B.V.

ASML MaskTools, Inc. ("MaskTools") (Euronext Amsterdam N.V. and Nasdaq: ASML) and Numerical Technologies, Inc. today announced that they have entered into a licensing agreement that will provide semiconductor manufacturers with easier access to subwavelength manufacturing solutions that incorporate MaskTools' patented scattering bar technology. Under the agreement, Numerical gains the rights to provide software solutions that incorporate scattering bar technology, and becomes the first external licensing partner to directly offer a scattering bar production license to semiconductor manufacturers on behalf of MaskTools.

"Scattering bar technology complements our offering of subwavelength manufacturing solutions very well," stated Atul Sharan, senior vice president of marketing and business development at Numerical Technologies. "We are committed to providing our customers with a complete portfolio of solutions that will enable them to successfully produce subwavelength silicon with maximum yield and minimum impact to their design-to-silicon flow. Scattering bars are a valuable addition to this portfolio."

"Numerical's decision to license our technology for implementation in their software products is a clear endorsement of the growing adoption and use of scattering bars across the industry," stated Dinesh Bettadapur, president and CEO of MaskTools. "With their market penetration and production technology licensing experience, they are well positioned to further the adoption of scattering bars by semiconductor manufacturers."

By enabling the design of sub-resolution features on a photomask, MaskTools' scattering bar technology can enlarge the process latitude and increase the manufacturing yields for integrated circuits with 180-nm feature sizes and below. These sub-resolution features also increase the depth of focus of the imaging process in the wafer fab. Scattering bar technology may be used in conjunction with Numerical's proprietary phase-shifting technology, which is rapidly gaining adoption as semiconductor companies extend the life of optical lithography well beyond the subwavelength barrier.

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