ASML MASKTOOLS LICENSES SCATTERING-BAR TECHNOLOGY TO IBM
10 July 2000 - ASML Netherlands B.V.

ASML MaskTools, a wholly owned subsidiary of ASML, today announced that International Business Machines has licensed ASML MaskTools patented scattering-bar technology for fabrication of application-specific integrated circuits with 130nm (0.13 micron) design rules.

The license allows IBM to begin using the optical extension technology to produce photomasks with advanced chip designs for both R&D and volume production.

This licensing agreement marks the first business between ASML MaskTools and IBM, the world's largest information technology company.

ASML MaskTools scattering bar-technology extends optical imaging technology and significantly increases depth-of-focus at sub-wavelength regimes. This enables a wider process window and cost-effective photomasks, attributes that are especially beneficial in manufacturing ASICs.

By enabling the design of sub-resolution features on a photomask, scattering-bar technology can greatly increase process yields for devices with 150nm feature sizes and below. These sub-resolution features increase the depth of focus of the imaging process in the wafer fab. Optical extension techniques, such as optical proximity correction, phase shifting, scattering bars and off-axis illumination, are allowing semiconductor companies to extend the life of deep UV lithography well beyond the sub-wavelength barrier.

"Our scattering-bar technology is the industry's most advanced and complete manufacturing solution for next-generation devices using today's optical tools," said Doug Marsh, president of ASML MaskTools. "We are extremely proud that IBM, a leading global semiconductor company, has selected our technology to support its next-generation chip production capabilities."

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  • For July 2000
  • From ASML Netherlands B.V.
  • For Lithography