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News by Category: Dielectrics and Porogens

Improved dielectric developed for chip-level copper circuitry
29 March 2005 - University of Illinois at Urbana-Champaign
A new dielectric material, developed by researchers at the University of Illinois at Urbana-Champaign, could facilitate the use of copper circuitry at the chip level. The thermally stable aromatic polymer has a low dielectric constant of 1.85, good mechanical properties and excellent adhesion.


 

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