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News

Rohm and Haas expands Delaware slurry manufacturing operations

Rohm And Haas Electronic Materials : 25 October, 2004  (Company News)
Rohm and Haas Electronic Materials CMP Technologies, a leader in polishing technology for the global semiconductor industry, has expanded its slurry manufacturing operations in Newark, Delaware, USA.
Rohm and Haas Electronic Materials CMP Technologies, a leader in polishing technology for the global semiconductor industry, has expanded its slurry manufacturing operations in Newark, Delaware, USA.

The move comes as the company is experiencing strong demand for its slurry products from top-tier semiconductor customers in the United States, Europe and Asia.

The expansion increases the facility's slurry manufacturing capacity by 3 million gallons per year, and enables Rohm and Haas Electronic Materials to dedicate high-volume manufacturing space to new copper and barrier slurry products, including the company's newest acidic and non-acidic barrier slurries for chemical mechanical planarization (CMP) of 90-nm and 65-nm low-k semiconductor devices.

'Our new high-volume slurry manufacturing capability has been designed to move products from pilot to production with identical performance and better consistency,' said Rich Baker, vice president of slurry technology for Rohm and Haas Electronic Materials CMP Technologies. 'We have already begun shipping products from our new manufacturing operation, and in two recent qualifications, we have sustained performance levels while improving control and consistency through high-volume manufacturing.

This expansion demonstrates the market's philosophy of copy exact and provides flexible manufacturing in a certified clean room environment. By implementing a control system, Rohm and Haas Electronic Materials can segregate slurry production, eliminating all cross-contamination and particulate risks. This results in repeatable, high- quality product and production efficiency improvements.

The Delaware Campus is the manufacturing headquarters for the CMP Technologies business of Rohm and Haas Electronic Materials and also houses an advanced CMP development center, as well as R&D for polishing pads and slurries. Recently, the facility achieved ISO 14001:1996 environmental management certification.
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