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Conductive Inks: booming to $2.8 billion by 2024
Lithography : 22 April, 2014
The conductive ink and paste business is segmented, consisting of many emerging and mature markets. In the new report Conductive Ink Markets 2014-2024: Forecasts, Technologies, Players IDTechEx sees the market experiencing 4.5% CAGR over the coming decade, although growth will be unevenly spread with several target markets experiencing rapid growth while others decline. Dr Khasha Ghaffarzadeh, Head of Consulting, IDTechEx, expands.
Tipping Point reached in printed and flexible electronics?
Lithography : 14 February, 2014
Dr Harry Zervos, Senior Technology Analyst, IDTechEx, reflects that 2014 has only just began and already discussions abound on how a "tipping point" has been reached in the field of printed and flexible electronics, a statement mostly backed by the significant interest and accompanying investment by LG and Samsung into the commercialisation of flexible displays.
New PAS 5500/1100TM system combines 90 WPH productivity with imaging performance
Lithography : 13 August, 2007
ASML introduced its newest 193nm Step & Scan lithography tool for high-volume production of semiconductor devices at the 100nm technology node. The PAS 5500/1100TM system provides the highest value of ownership for leading-edge IC makers by combining a 0.75 numerical aperture lens, improved leveling performance and industry-leading overlay with an exposure capacity exceeding 90 200mm wafers per hour at a dose of 20 mJ/cm2.
New lithography system with the highest numerical aperture
Lithography : 12 August, 2007
ASML Holding NV announced a new lithography system with the highest numerical aperture, 1.2, in the semiconductor industry. The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of volume chip production at the 45 nm node.
New immersion lithography system a 0.85 NA, 193 nm pre-production lithography scanner
Lithography : 11 August, 2007
ASML Holding NV announced the industry
ASML now offers the highest numerical aperture at every major production wavelength
Lithography : 10 August, 2007
ASML introduced the industry's first KrF (248nm) Step & Scan 300mm dual stage lithography system capable of 110nm resolution. The TWINSCAN AT:850B(tm) features Carl Zeiss Starlith(tm)850 advanced projection optics with a numerical aperture of 0.80, which is the highest NA available in a KrF system.
New i-Line and KrF Systems provide industry's highest productivity
Lithography : 15 July, 2007
ASML announces the introduction of dual wafer stage technology for new i-line and deep UV imaging systems, extending the product offerings of its TWINSCANTM 300mm technology platform. This dual wafer stage system optimizes the lithographic processing of 300mm wafers by parallel operation of two independent wafer stages.
New agreement combines expertise in imaging equipment, software and advanced processes
Lithography : 14 July, 2007
In a move to eliminate the growing gap between semiconductor design and sub-wavelength manufacturing, ASML MaskTools, a wholly owned subsidiary of ASML, and Mentor Graphics Corporation have signed a collaborative agreement.
ASML to deliver advanced resolution techniques to SEMATECH for manufacturing research
Lithography : 13 July, 2007
ASML Holding NV announced that semiconductor R&D consortium SEMATECH has awarded ASML a contract to qualify the imaging performance of advanced logic patterns, metrology structures and defect designs for the 45-nanometer (nm), 32-nm, and 22-nm technology nodes.
ASML, industry partners advance EUV development
Lithography : 12 July, 2007
ASML Holding NV and partners in the semiconductor lithography supply chain provided an update today on their progress towards the commercialization of extreme ultraviolet lithography.
Hynix adopts ASML
Lithography : 11 July, 2007
ASML Holding NV announced that Hynix Semiconductor Inc., one of the world
ASML extends ArF leadership & enables double patterning development with new TWINSCAN XT:1450
Lithography : 10 July, 2007
ASML Holding NV introduced its newest TWINSCAN system, an advanced 193-nanometer (nm) exposure system which features imaging, overlay and throughput improvements.
ASML reinforces potential for value generation in advanced semiconductor lithography
Lithography : 09 July, 2007
ASML Holding NV and Brion Technologies, Inc. announced that they have signed an agreement for ASML to acquire privately held Brion, a leading provider of semiconductor design and wafer manufacturing optimization solutions for advanced lithography.
ASML MaskTools and Mentor Graphics to bridge semiconductor optical lithography barriers
Lithography : 09 December, 2000
In a move to eliminate the growing gap between semiconductor design and sub-wavelength manufacturing, ASML MaskTools, a wholly owned subsidiary of ASML, and Mentor Graphics Corporation have signed a collaborative agreement.
ASML Special Applications Division introduces high-productivity PAS 5500/150 i-line lithography system
Lithography : 10 October, 2000
ASML's Special Applications division today introduced a new i-line lithography system for 0.35-micron imaging, designed to assist customers as they transition from manufacturing technologies above 0.5 micron to tighter resolutions.
UMC to use ASML MaskTools scattering-bar technology in manufacturing World s largest FPGA
Lithography : 01 August, 2000
ASML MaskTools today announced that UMC, a leading semiconductor foundry, has licensed ASML MaskTools optical extension technology for manufacturing advanced semiconductors with 150nm design rules.
Nine leading IC makers sign up with ASML to develop 157nm lithography solutions
Lithography : 13 July, 2000
Nine leading-edge semiconductor manufacturers have joined ASML's industry-wide 157nm lithography technology program, which the lithography equipment leader launched 11 months ago. Advanced Micro Devices, Infineon, Motorola, Philips, Taiwan Semiconductor Manufacturing Company, ST Microelectronics and three other top ten IC manufacturers have joined ASML and its strategic technology partners, including Carl Zeiss, in the program to extend imaging capabilities and deliver 157nm lithography systems for advanced IC manufacturing by 2003.
ASML MaskTools licenses scattering-bar technology to IBM
Lithography : 10 July, 2000
ASML MaskTools, a wholly owned subsidiary of ASML, today announced that International Business Machines has licensed ASML MaskTools patented scattering-bar technology for fabrication of application-specific integrated circuits with 130nm (0.13 micron) design rules.
ASML launches new TWINSCAN 300mm lithography platform
Lithography : 10 July, 2000
A new 300mm lithography platform enabling the highest productivity at the limits of optical technology has been announced by ASML, a world leader in semiconductor photolithography systems. The new platform and the first system in this new product family, the AT:700S(tm) scanner, were introduced today at the annual SEMICON/West trade show.
New tool delivers simultaneous improvements in imaging, overlay and productivity
Lithography : 04 April, 2000
ASML has announced the semiconductor industry's first KrF (248nm wavelength) lithography system optimized for high-volume production of ICs with 130nm design rules. The new PAS 5500/750E deep ultraviolet Step & Scan tool, introduced here at the annual SEMICON Europa trade show, provides a complete process solution by delivering significant improvements in imaging, overlay and productivity.
Sawtek receives I-Line Lithography System from ASML special applications
Lithography : 07 March, 2000
In its first business with a manufacturer of surface acoustic wave components, ASML's Special Applications division has installed a PAS 5500/250C i-line stepper at Sawtek Inc.'s manufacturing facility outside Orlando, Florida. Capable of achieving sub-half-micron resolution, the lithography tool will be used in producing SAW filters for telecommunication applications.
ASML MaskTools offers scattering-bar IP for use with mentor graphics' calibre software
Lithography : 29 February, 2000
Further closing the gap between semiconductor design and manufacturing, ASML MaskTools, a wholly owned subsidiary of ASM Lithography, and Mentor Graphics Corporation offer the first three deliverables of their collaborative agreement from December 1999.
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